| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31604
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 |
| filingDate |
1970-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1972-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02030669d6fe59b8a7c07a3c606b3429
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29c4cd9bda9decc80dfa0dc139011e24 |
| publicationDate |
1972-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-3706597-A |
| titleOfInvention |
Glass vapor deposition on surfaces of semiconductor elements |
| abstract |
A PROCESS FOR VAPOR DEPOSITION OF GLASS FILMS ON SEMICONDUCTOR MATERIALS WHICH COMPRISES HEATING THE SEMICONDUCTOR MATERIAL IN AN ATMOSPHERE MIXTURE OF ORGANO SILICON, ORGANO LEAD, OXYGEN AND NITROGEN. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4098923-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4144684-A |
| priorityDate |
1970-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |