| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f4ff9ddf728a7e1a0b36c9cc38b89ad6 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S148-043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S148-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-948
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-977
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S148-051 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-763
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 |
| filingDate |
1969-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1972-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_19973481dd5e2a24661bd3e79d01e5ec |
| publicationDate |
1972-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-3671338-A |
| titleOfInvention |
Method of manufacturing a semiconductor photo-sensitive device |
| abstract |
A METHOD OF MANUFACTURING A SEMICONDUCTOR PHOTOSENSITIVE DEVICE INCLUDES THE STEPS OF FORMING A POLY CRYSTAL FORMATION LAYER ON THE FLAT SURFACE OF AN N-TYPE SEMICONDUCTOR SUBSTRATE EXCLUDING THE PERIPHERAL EDGE THEREOF, DEPOSITING A CRYSTAL LAYER ON THE SURFACE INCLUDING A POLY CRYSTAL REGION OVERLAYING THE POLY CRYSTAL FORMATION LAYER, FORMING A PLURALITY OF PN JUNCTIONS IN THE OPPOSITE SURFACE OF THE SUBSTRATE, AND REMOVING THE POLY CRYSTAL REGION, THEREBY FORMING A RECESS STRUCTURE SUBSTRATE. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4782028-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4125418-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-3912559-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5134090-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-2411517-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4522661-A |
| priorityDate |
1968-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |