| abstract |
A method of chemical vapor deposition (CVD) of a hard layer on a substrate such as cemented tungsten carbide and the product resulting from such method; the method involves a more rapid and more easily controlled CVD of a hard metal such as titanium carbide, by providing an intermediate layer of a refractory interface barrier such as refractory metal on the cemented carbide materials to prevent deleterious interaction between the substrate and the hard metal layer and to obtain a hard wear surface with good composite strength characteristics and bond to the substrate; the product is the resulting composite substrate with the interface metal and the face metal. |