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filingDate 1967-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1972-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_915395b48ff21bb674a50c2a9f7fde2d
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publicationDate 1972-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-3634086-A
titleOfInvention Solvent development of light-sensitive diazo layers
abstract The development of positive-working light-sensitive diazo layers for use as lithographic printing plates and photoresists is effected using selectively acting organic solvents to dissolve light-struck areas.
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priorityDate 1966-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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