| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d2051317369a779747701bc0ebe411a4 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-12 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-0025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C3-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L67-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41C3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L67-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
1969-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1971-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4516fc1f5228e0859e2336e0ccef0f5 |
| publicationDate |
1971-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-3615952-A |
| titleOfInvention |
Photoresist composition and method of forming and using the same |
| abstract |
A resist composition comprising an alkyd resin made by reacting together phthalic anhydride, pentaerythritol, trimethyl propane, tall oil fatty acid, and benzoic acid and then removing about 1540 percent of the low molecular weight ends. The resist may be made photosensitive by adding a sensitizer. |
| priorityDate |
1969-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |