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filingDate 1969-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1971-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_34db6739dabf5f4a4090d5332e53cd20
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publicationDate 1971-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-3598084-A
titleOfInvention Vapor deposition chamber including sealing and heating means
abstract There are provided an apparatus, closure means therefore, for continuously effecting the pyrolytic deposition of boron on an electrically conductive substrate. The apparatus comprises a vertical tubular reactor chamber, novel closure means on both the top end and bottom end of the chamber which operate by capillary principle to retain an electrically conductive fluid serving as both a seal and an electrical contact for heating purposes and which include passageways for cooling and reactant gases, inlet means for feeding cooling and reactant gases into the reactor through said closure means, and outlet means for exiting excess cooling and reactant gases and byproduct gases from said chamber.
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