| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d9f3ca41550d315642580237250c5b0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-825
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C5-3021
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C5-315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-092 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-825
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-06 |
| filingDate |
1964-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1968-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_316460afdd5aa1cfbf558aac4f966359 |
| publicationDate |
1968-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-3369903-A |
| titleOfInvention |
Light sensitive element for preparing etching resist for gravure purposes |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4226927-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-8002879-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5300398-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4407932-A |
| priorityDate |
1964-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |