| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d6c7abd1665a53282a4bcbc630cc7e70 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0898
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2204-002 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J4-002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J12-002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J12-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-021
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J12-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-021
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08 |
| filingDate |
2020-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4b479d5d4bc034be3d3cd0c1ddc6a6c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93b312bfa3422f9666cebd2b639a34ac
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_361a2dee51280be32de5a59668ef6ff8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_330d6fd839f7527932d60c2c723326ae |
| publicationDate |
2022-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2022410114-A1 |
| titleOfInvention |
Device and method of producing liquid silicon |
| abstract |
An apparatus that forms liquid silicon includes a. a device by which a gas can be brought to a high-temperature state in which it is at least partially present as plasma, b. a reaction space and a feed conduit for the high-temperature gas opening into the reaction space, c. a nozzle having a nozzle channel that opens directly into the reaction space and through which a gaseous or particulate silicon-containing starting material can be fed into the reaction space, and d. a device adapted to introduce an inert gas into the reaction space such that it protects the exit opening of the nozzle channel against thermal stress resulting from the high-temperature gas. |
| priorityDate |
2019-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |