Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c85d78c6a4459b5dbbc49c82a4c5c107 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3218 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2068 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-0073 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C217-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-30 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C217-08 |
filingDate |
2019-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_158c0e5c0d1395cde0038dd484913283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_970dd6fa471eb63a909d91073c63aef3 |
publicationDate |
2022-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2022365440-A1 |
titleOfInvention |
Photoresist stripping composition |
abstract |
A photoresist stripping composition comprising an organic amine and a method is provided. The photoresist stripping composition comprising an organic amine having the following formula (1). |
priorityDate |
2019-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |