| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-146 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-83
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-3757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-378
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-146
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02074
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-3769
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-3765
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-3773
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2079
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D17-0008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-37
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D1-83 |
| filingDate |
2022-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_416a3b848f275cfadcfc35f4c9bce7b7 |
| publicationDate |
2022-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2022315865-A1 |
| titleOfInvention |
Surface treatment composition, method for manufacturing surface treatment composition, surface treatment method, and method for manufacturing semiconductor substrate |
| abstract |
There is provided a means capable of sufficiently removing organic residues present on the surface of an object to be polished after polishing containing silicon nitride or polysilicon. A surface treatment composition containing: a polymer having a constituent unit represented by Formula (1) in [Chem. 1] below; at least one of an anionic surfactant and a nonionic surfactant; and water, in which the surface treatment composition is used for treating the surface of an object to be polished after polishing,in which, in Formula (1) above, R1 is a hydrocarbon group having the number of carbon atoms of 1 to 5, and R2 is a hydrogen atom or a hydrocarbon group having the number of carbon atoms of 1 to 3. |
| priorityDate |
2021-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |