| abstract |
[Problem] To provide a gate insulating film forming composition comprising a polysiloxane, which forms a gate insulating film having excellent characteristics such as high dielectric constant and high mobility. [Means for Solution] The gate insulating film forming composition comprises (I) a polysiloxane, (II) barium titanate, and (III) a solvent, wherein the content of the barium titanate is 30 to 80 mass % based on the total mass of the polysiloxane and the barium titanate. |