http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022262986-A1

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filingDate 2021-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82b6a3184cc6c232fff3c720e87f96b9
publicationDate 2022-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2022262986-A1
titleOfInvention Semiconductor device and fabricating method therefor
abstract The present invention relates to a semiconductor device ( 10 ), comprising a substrate ( 11 ), a semiconductor layer ( 12 ), a stressor layer ( 13 ), an insulator barrier ( 14 ) and a plurality of electrical connectors. The semiconductor layer ( 12 ) is sandwiched between the substrate ( 11 ) and the stressor layer ( 13 ). The stressor layer ( 13 ) is on top of the semiconductor layer ( 12 ) and is capable of inducing strain on the semiconductor layer ( 12 ). A method for fabricating a semiconductor device comprises the steps of forming a substrate ( 110 ), epitaxially growing a semiconductor layer on the substrate ( 120 ), depositing a stressor layer on the semiconductor layer ( 130 ) and forming a plurality of electrical connectors ( 140 ), wherein the electrical connectors are capable of electrically connecting the semiconductor device to an external circuit.
priorityDate 2020-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 29.