| abstract |
Provided is a copolymer having a carbosiloxane dendrimer structure, where the amount of monomers having a carbosiloxane dendrimer structure is significantly reduced. Also provided is a composition, cosmetic raw material, film-forming agent, and a cosmetic material comprising the copolymer, as well as a method of manufacturing the copolymer and the like. The copolymer is a copolymer of (a1) an unsaturated monomer having a carbosiloxane dendrimer structure having a radically polymerizable organic group, and (a2) an unsaturated monomer having a radically polymerizable vinyl group, which is different from component (a1). The amount of unreacted unsaturated monomers (a1) and saturated monomers derived from the unreacted unsaturated monomers (a1) is 2500 ppm or less relative to the copolymer. |