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publicationDate 2022-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2022204659-A1
titleOfInvention Photocurable composition for making layers with high etch resistance
abstract A photocurable coraposition can comprise a polyme.aizable material and a photoinitiator, wherein the polymerizahle material can comprise at least one acrylate monomer including at least one cyano group (CN-acrylate monomer). The presence of a low amount of the CN-acrylate monomer between 10 wt% and not greater than 30 wt% can lower the contact angle of the composition and may improve the etch resistance of a photo-cured layer made from the photocurable composition.
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