Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F120-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-48 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F120-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 |
filingDate |
2020-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d0f914349a23ecd2712c458d8826fbc7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56c3813559509189f67d33d287585247 |
publicationDate |
2022-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2022204659-A1 |
titleOfInvention |
Photocurable composition for making layers with high etch resistance |
abstract |
A photocurable coraposition can comprise a polyme.aizable material and a photoinitiator, wherein the polymerizahle material can comprise at least one acrylate monomer including at least one cyano group (CN-acrylate monomer). The presence of a low amount of the CN-acrylate monomer between 10 wt% and not greater than 30 wt% can lower the contact angle of the composition and may improve the etch resistance of a photo-cured layer made from the photocurable composition. |
priorityDate |
2020-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |