http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022181479-A1

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filingDate 2020-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3607d6957090024a053d6a12ffe007f0
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publicationDate 2022-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2022181479-A1
titleOfInvention Wide bandgap semiconductor device with a self-aligned channel and integration schemes
abstract A semiconductor device is provided. The semiconductor device comprises a substrate having a wide bandgap semiconductor material and an epitaxial layer arranged over a first surface of the substrate. A source region having a first conductivity type may be arranged in the epitaxial layer. A well region having a second conductivity type may be laterally adjacent to the source region. The first conductivity type may be different from the second conductivity type. A gate dielectric layer may be arranged over the well region. A field dielectric layer may be arranged over the epitaxial layer adjacent to the well region.
priorityDate 2020-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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