| abstract |
A photo-curable composition for use in additive manufacturing, said composition comprising: a) at least one photocurable monomer or oligomer; b) a photoinitiator for polymerization of the monomer; and, from 0.01 to 1 wt. %, based on the weight of the composition, of c) CNS-derived materials. Following polymerization, the resulting polymerized composition has a volume resistivity no greater than 105 ohm·cm. |