| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7ef01e33058cf740cf2197991be97af1 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-418
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-3324 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G61-06 |
| filingDate |
2020-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f540f94c18684703221a5548da5fb4ce
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f72b4bca97174f8504ca9fd95d74f0c2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f19551d8554925176fbf60da916b7089
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74d65a125f6d88a4a4fa33cd2e1b1667 |
| publicationDate |
2022-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2022050379-A1 |
| titleOfInvention |
Material for forming underlayer film, resist underlayer film, and laminate |
| abstract |
A material for forming an underlayer film used in a multi-layer resist process satisfies: (i) an elemental composition ratio Re defined by the following mathematical formula (1) is 1.5 to 2.8; (ii) a glass transition temperature is 30° C. to 250° C.; and (iii) the material contains at least one (preferably two or more) resin having a specific structural unit. In the mathematical formula (1), NH is the number of hydrogen atoms in the solid content of the material for forming an underlayer film, NC is the number of carbon atoms in the solid content of the material for forming an underlayer film, and NO is the number of oxygen atoms in the solid content of the material for forming an underlayer film.Re=NH+NC+NONC-NO(1) |
| priorityDate |
2019-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |