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filingDate 2019-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2022-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2022042173-A1
titleOfInvention Carbon hard mask, film forming apparatus, and film forming method
abstract According to one embodiment, there is provided a carbon hard mask laminated on an etching target film, in which the concentration ratio of a methylene group CH 2 and a methyl group CH 3 contained in the carbon hard mask satisfies the expression CH 2 /(CH 2 +CH 3 )≥0.5.
priorityDate 2018-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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