| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_696ca0ae93d5cf5a686273601361781f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-127
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32139
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-123
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D179-085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-0233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-0025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D207-452 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D179-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D207-452 |
| filingDate |
2019-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01c838b401651fdfb93077a0d9a55324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_469d1e7c5e5643ab25b964fdd02100f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e988526669b82e47d58d5794697841e2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f853984c85e67773ba6e4556eadbb0f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef0af45479c135acf473251dbba4e6ad |
| publicationDate |
2022-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2022019146-A1 |
| titleOfInvention |
Film forming material for lithography, composition for film formation for lithography, underlayer film for lithography, and method for forming pattern |
| abstract |
The present invention provides a film forming material for lithography comprising a compound having:n a group of formula (0A): nn n n n n n n n n n n n and n a group of formula (0B): n n n n n n n n n n n n n n whereinn each R is independently selected from the group consisting of a hydrogen atom and an alkyl group having 1 to 4 carbon atoms, provided that at least one R is an alkyl group having 1 to 4 carbon atoms. |
| priorityDate |
2018-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |