| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8fb9f44db08d1c42a53f3d28eaae416f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105 |
| filingDate |
2019-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4ee9695782e6dc648651a5efb905c586
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15727d8fc324484e04443b19aa2e75d7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c9d117d5780a8b96f8062d4b76ae7f0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f3f4949a2345f7a187b8780582ff500
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd79976d365387f2862b87fdf00b7127 |
| publicationDate |
2022-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2022002588-A1 |
| titleOfInvention |
Polishing liquid composition for silicon oxide film |
| abstract |
Provided is a polishing liquid composition that is able to improve the polishing rate of a silicon oxide film in one aspect. n An aspect of the present disclosure relates to a polishing liquid composition for a silicon oxide film. The polishing liquid composition contains cerium oxide particles (component A), an additive (component B), and an aqueous medium. The component B is a compound having a reduction potential of (145 V or more when a 10 ppm aqueous solution of the component B is measured by cyclic voltammetry (with an Ag/AgCl electrode as a reference). |
| priorityDate |
2018-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |