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publicationDate 2021-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2021395884-A1
titleOfInvention Silicon precursor compounds and method for forming silicon-containing films
abstract Provided are certain silicon precursor compounds which are useful in the formation of silicon-containing films in the manufacture of semiconductor devices, and more specifically to compositions and methods for forming such silicon-containing films, such as films comprising silicon dioxide or silicon nitride.
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