| abstract |
This disclosure relates to a semiconductor resist composition including an organometallic compound represented by Chemical Formula 1 and a solvent, and to a method of forming patterns using the composition: n Chemical Formula 1 n n n n n n n n n n wherein, in Chemical Formula 1, R 1 is an aliphatic hydrocarbon group, an aromatic hydrocarbon group, or an -alkyl-O-alkyl group, and R 2 to R 4 are each independently selected from —OR a and —OC(═O)R b . |