Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c19a91365ed494d9fe27d24190d4459f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_65aa22bcc8da87a6c99b46e5dc8b28eb |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31127 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30655 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6836 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-68381 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-68327 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-6834 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-6886 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-183 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-199 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-672 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-189 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6835 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D167-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D167-02 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-183 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-189 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D167-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-78 |
filingDate |
2020-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a1f95472eaddb010d1c178f73bb4c92 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94c38f8dcf2f8bea065fb521b14e8888 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f91275c23a3adad92ac3f09357ce7cd7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79684a58b1736956921935ab2bb9bcf0 |
publicationDate |
2021-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2021324226-A1 |
titleOfInvention |
Method for fabricating semiconductor device chips and protective composition |
abstract |
A protective composition contains a water-soluble polyester resin including a polyvalent carboxylic acid residue and a polyvalent alcohol residue. The polyvalent carboxylic acid residue includes: a polyvalent carboxylic acid residue having a metal sulfonate group; and a naphthalene dicarboxylic acid residue. The proportion of the polyvalent carboxylic acid residue to the polyvalent carboxylic acid residue falls within the range from 25 mol % to 70 mol %. The proportion of the naphthalene dicarboxylic acid residue to the polyvalent carboxylic acid residue falls within the range from 30 mol % to 75 mol %. |
priorityDate |
2020-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |