| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6821349e83f8714103cf65b3fc17c317 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3209
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D17-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3281
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2058
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02074
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D17-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00 |
| filingDate |
2021-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d2fb2cc20d9f7b8d8f40bbf679c9e346
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa9863684bfded531fea4ee7d94ddfc0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2add3ceda1f0749b404ced766f69263
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3a453ff703b80a4f8c2258c36d44f9d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_557e3244c6baf99af11f657ac2621eaa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4e415d2029fa55893909029f7ad0dd8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_46bc35fc907922687efe47f06acf0e03 |
| publicationDate |
2021-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2021317391-A1 |
| titleOfInvention |
Kit for cleaning agent and method for preparing cleaning agent |
| abstract |
The present invention addresses the problem of providing a kit for a cleaning agent, which is used for the purpose of preparing a cleaning agent that maintains, even after long-term storage, adequate impurity removal performance from the surface of a semiconductor substrate that has been subjected to a CMP process. The present invention also addresses the problem of providing a method for preparing the above-described cleaning agent. A kit for a cleaning agent according to the present invention is a kit for preparing a cleaning agent which is used for cleaning of a semiconductor substrate that has been subjected to a CMP process, and which has a pH of from 7.5 to 13.0. This kit for a cleaning agent comprises a first liquid that is acidic and contains a compound represented by formula (1) and a second liquid that is alkaline and contains a basic compound; and an acidic compound is contained in at least one of the first liquid and the second liquid. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021340445-A1 |
| priorityDate |
2018-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |