Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8adaddc602ad7cb7f9e2d550681bb36d |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29K2105-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29K2083-00 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
filingDate |
2021-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d92630ed000f150fc6ea9e2de984548b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24b5805e6bfca3a1f03c5b79b3a8caba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9920b5f39625afda5099aedc2828dcd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56eb6a3482ba29389ef81c4b882df029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4cd0c7a62ebf5332584fe171f588c498 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3b36a8146ac0160197e9d70f63f7cb8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e0aed1b3aad4c702b0ca7b12b707874 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14ba6ac6470b8d97eed50256782a9966 |
publicationDate |
2021-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2021302832-A1 |
titleOfInvention |
Imprinting apparatus |
abstract |
An imprinting apparatus includes a silicon master and an anti-stick layer coating the silicon master. The silicon master includes a plurality of features positioned at an average pitch of less than about 425 nm, each of the plurality of features comprises a depression having an opening with its largest opening dimension being less than about 300 nm. The anti-stick layer includes a crosslinked silane polymer network. |
priorityDate |
2020-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |