| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D125-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D161-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D161-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D125-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D161-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D161-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D133-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-32 |
| filingDate |
2021-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_28822d7408eab9f123bf757caa7d3cd7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_813e0e460b2bf852de31d8762bc4b614 |
| publicationDate |
2021-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2021286267-A1 |
| titleOfInvention |
Composition, resist underlayer film, and resist pattern-forming method |
| abstract |
A composition contains: an aromatic ring-containing compound; a fluorine atom-containing polymer; and an organic solvent. The fluorine atom-containing polymer has: a first structural unit represented by formula (1); and a second structural unit represented by formula (2). In the formula (1), R 1 represents a fluorine atom-containing monovalent organic group having 1 to 20 carbon atoms; and R 2 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms. In the formula (2), R 3 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms; and R 4 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms. |
| priorityDate |
2018-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |