| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c28d4ea320b90ed19f8de42eb1428cc8 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K15-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K15-30 |
| filingDate |
2021-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1474e8f795a4ee97494d211429aef59c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97a10f9b4d1dd1bfea0d9beea5756a68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_493a0e1ad721eb600adc28f3e6f01a3f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cce9e914a5cb9ac635dd51afa829e67c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1dfc16231c3b42aff13460e320dd2272 |
| publicationDate |
2021-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2021253903-A1 |
| titleOfInvention |
Polishing compositions and methods of use thereof |
| abstract |
A polishing composition includes an abrasive; a pH adjuster; a barrier film removal rate enhancer; a low-k removal rate inhibitor; an azole-containing corrosion inhibitor; and a hard mask removal rate enhancer. A method of polishing a substrate includes the steps of: applying the polishing composition described herein to a surface of a substrate, wherein the surface comprises ruthenium or a hard mask material; and bringing a pad into contact with the surface of the substrate and moving the pad in relation to the substrate. |
| priorityDate |
2020-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |