| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eb2648e65ad8850515bd727a122f1186 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F17-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-28 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F17-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 |
| filingDate |
2021-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1ec61fadf4f2f402d0143e7727ce7e8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_63b5ef45b761622d8770db12063abf6c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93a21d514e9557fbb66a9ceffc6458bc |
| publicationDate |
2021-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2021221830-A1 |
| titleOfInvention |
Methods for vapor deposition of group 4 transition metal-containing films using group 4 transition metal-containing films forming compositions |
| abstract |
Group 4 transition metal-containing film forming compositions comprising Group 4 transition metal azatrane precursors are disclosed. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Group 4 transition metal-containing films on one or more substrates via vapor deposition processes. |
| priorityDate |
2016-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |