http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021205858-A1

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filingDate 2021-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d4efb466fa2c02b8be3289f70ce1520
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publicationDate 2021-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2021205858-A1
titleOfInvention Conditioning chamber component
abstract A method for conditioning a component of a wafer processing chamber is provided. The component is placed in an ultrasonic conditioning solution in an ultrasonic solution tank. Ultrasonic energy is applied through the ultrasonic conditioning solution to the component to clean the component. The component is submerged in a megasonic conditioning solution in a tank. Megasonic energy is applied through the megasonic conditioning solution to the component to clean the component.
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