| abstract |
A resist composition which contains a polymer compound having a constitutional unit (a01) represented by General Formula (a01-1) and a constitutional unit (a02) represented by General Formula (a02-1), in which a proportion of the constitutional unit (a01) is more than 50% by more and 70% by mole or less, in General Formula (a01-1), Xa 01 represents a group that forms a monocyclic alicyclic hydrocarbon group together with Ya 01 , and Ra 01 is a group represented by General Formula (a0-r-1), in Formula (a02-1), Ra 02 represents a group represented by any one of General Formulae (a5-r-1) to (a5-r-4) |