| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6813f68bbadbcaae3828aa035190fede
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89b170728e9b1de7f20c98f2fbc2a113 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3321 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32183
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32119
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32899
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32697 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
2019-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a1e4e729af35917ef626517db58ba79
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d75c961be148be8fcbf40c23dd7ef77e |
| publicationDate |
2021-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2021020411-A1 |
| titleOfInvention |
Variable mode plasma chamber utilizing tunable plasma potential |
| abstract |
Plasma processing apparatus and associated methods are provided. In one example, a plasma processing apparatus can include a plasma chamber configured to be able to hold a plasma. The plasma processing apparatus can include a dielectric window forming at least a portion of a wall of the plasma chamber. The plasma processing apparatus can include an inductive coupling element located proximate the dielectric window. The inductive coupling element can be configured to generate a plasma from the process gas in the plasma chamber when energized with radio frequency (RF) energy. The plasma processing apparatus can include a processing chamber having a workpiece support configured to support a workpiece. The plasma processing apparatus can include an electrostatic shield located between the inductive coupling element and the dielectric window. The electrostatic shield can be grounded via a tunable reactive impedance circuit to a ground reference. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11189464-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11189466-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11521833-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11195698-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11557461-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11570879-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023055800-A1 |
| priorityDate |
2019-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |