| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_34c88c465202a4bc7d8388cca9c9bf52 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-95676 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-278
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-956
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-93
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-58 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-956
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-58 |
| filingDate |
2020-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d00c2751a8665b398380cf6e9b46e672
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea37c42a7fd99c8470e5d82ecc4e47b5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e47969d9fb831ae7ff3be9af21447278 |
| publicationDate |
2020-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2020401037-A1 |
| titleOfInvention |
EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test Photomasks |
| abstract |
To calibrate a TDI photomask inspection tool, a photomask with a plurality of distinctly patterned regions is loaded into the tool. The plurality of distinctly patterned regions is successively illuminated with an EUV beam of light. While illuminating respective distinctly patterned regions, respective instances of imaging of the respective distinctly patterned regions are performed using a TDI sensor in the inspection tool. While performing the respective instances of imaging, a reference intensity detector is used to measure reference intensities of EUV light collected from the photomask. Based on the results of the respective instances of imaging and the measured reference intensities of EUV light, linearity of the TDI sensor is determined. |
| priorityDate |
2019-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |