| abstract |
An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern thus formed has excellent LER and collapse suppressing ability. Furthermore, another object of the present invention is to provide a resist film, a pattern forming method, a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition. In addition, still another object of the present invention is to provide a resin which can be used in the actinic ray-sensitive or radiation-sensitive resin composition. n The actinic ray-sensitive or radiation-sensitive resin composition of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition including a compound that generates an acid upon irradiation with actinic rays or radiation, and a resin whose polarity increases by the action of an acid,n in which the resin includes a repeating unit represented by General Formula (B-1), and a content of the repeating unit represented by General Formula (B-1) is 5% to 70% by mass with respect to all the repeating units in the resin. In General Formula (B-1), R 1 represents a hydrogen atom or an organic group, the Ring W1 represents a ring which includes at least one carbon atom and one nitrogen atom, and may have a substituent |