Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a34d7d2e0d09a58cb7bf4a04c81162e |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53238 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76844 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76873 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-481 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76831 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76829 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76898 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
filingDate |
2019-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb2ff4ca325e10e2b15fb0a5df3504a3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5c1121060a067459be6ba1f7057898a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb4abd83b4dbc262400c9bc69f60acf7 |
publicationDate |
2020-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2020365459-A1 |
titleOfInvention |
Through silicon via fabrication |
abstract |
One or more embodiments are directed to establishing electrical connections through silicon wafers with low resistance and high density, while at the same time maintaining processability for further fabrication. Such connections through silicon wafers enable low resistance connections from the top side of a silicon wafer to the bottom side of the silicon wafer. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11430695-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11776849-B2 |
priorityDate |
2019-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |