http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020354833-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ca2c327f5012e9a6f797c08eef1bb382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45555
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-403
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45529
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0272
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0281
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-02
filingDate 2019-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_367d980aafe18cb210e9a94bf3441abc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f89a811ffff93df924458b5ad52f15f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c488d75a4638cffa8a22298ff3bd4a11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ca896382759e31dba36a5659a67d195
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de6ace9af2a63348bd7ecdb089e7e17c
publicationDate 2020-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2020354833-A1
titleOfInvention Coating for halide plasma resistance
abstract A method of forming a protective coating film for halide plasma resistance includes depositing a seed layer on a surface of an article via an atomic layer deposition (ALD) process, depositing a rare-earth containing oxide layer on the seed layer via an ALD process, and exposing the rare-earth containing oxide layer to fluorine-containing plasma.
priorityDate 2019-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID935
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID150906
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID450964499
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2124
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9989226
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID28179
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID784
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14917
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23926
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID412550040
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID83679
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559561
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID83675
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577474
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID93091
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23986
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559562
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457765275
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID82832
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24823
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559362
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577485
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID292779
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559478
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451818717
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419520551
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559168
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457160489
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419520488
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419491804
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415777542
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419520403
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359268
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16682925
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123

Total number of triples: 69.