| abstract |
The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). In the formula, R 1 represents one or two groups selected from groups below, D 1 represents a polymerizable unsaturated group represented by chemical formula D 1 -1 or D 1 -2 below, R 2 represents a hydrogen atom or a methyl group, m1 and m2 represent 1 to 2, A 1 represents an alkylene group with 2 to 4 carbon atoms, and m3 represents 1 to 100. |