| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_99505f5f312672820e9f78c254c00a4d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_37f4922dfb7777b019e504b885211b8e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_59924c7203b1a1fa066ebf4f7696ad70 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E60-50 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M8-1253
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-083
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-5853
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3492
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M8-1246
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M8-126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-35 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M8-1253
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M8-126 |
| filingDate |
2018-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a5ac521af4443b29f77ed8db6b6b9af
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a6d1c84337e2ef9a368679873088990
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb3eaca18e3832f14045dc58d5594050 |
| publicationDate |
2020-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2020313218-A1 |
| titleOfInvention |
Method for manufacturing an electrolyte for solid oxide cells by magnetron cathode sputtering |
| abstract |
A method of manufacturing by magnetron cathode sputtering an electrolyte film for use in solid oxide cells (SOC). This method comprises the steps consisting of heating a substrate to a temperature ranging from 200° C. to 1200° C.; followed by subjecting the substrate to at least two treatment cycles, each treatment cycle comprising: 1) depositing one layer of a metal precursor on the substrate by magnetron cathode sputtering of a target made up of the metal precursor, the sputtering being carried out under elemental sputtering conditions; followed by 2) oxidation-crystallisation of the metal precursor forming the layer deposited on the substrate in the presence of oxygen to obtain the transformation of the metal precursor into the electrolyte material; and in that the substrate is kept at a temperature ranging from 200° C. to 1200° C. for the entire duration of each treatment cycle. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114843542-A |
| priorityDate |
2017-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |