| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d21cbff64022f95c237c0bd3ec8656ca
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ff81a650b70e913d3b2524b45e4c7320
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e400c7cafe4d27546b9127d5fdd3312b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-08 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-403
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-407
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L39-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J3-2053 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L39-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J3-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-16 |
| filingDate |
2020-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3fd49b2fbea48df7928c4ab1f5f4ffff
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be10c8b9ad850374acb109b94dda742d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_afb5bbc5d974a6ccb3fe58ec33974446
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea28d01a02b80af1cca678c3661b1b87
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43f91ae22b3759c31797a0a65eb3020e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e35e10c525e04504be681da5d8e97eb2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0baf33286569e91e0356c41d26fb2664 |
| publicationDate |
2020-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2020285148-A1 |
| titleOfInvention |
Inorganic-Infiltrated Polymer Hybrid Thin Film Resists for Advanced Lithography |
| abstract |
The present invention provides a method that utilizes an existing infrastructure such as atomic layer deposition or similar vapor-based deposition tool or metal salt solutions based infiltration to infiltrate certain metals or metal-based precursors into resist materials to enhance the performance of the resists for the advancement of lithography techniques. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11177129-B2 |
| priorityDate |
2019-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |