| abstract |
A polishing composition include a compound represented by the following formula (1), a cerium oxide particle, and water. R 1 is S − , SR 11 where R 11 is a hydrogen atom or a hydrocarbon group optionally containing a hetero atom, N − R 12 where R 12 is a hydrogen atom or a hydrocarbon group optionally containing a hetero atom, NR 13 R 14 where R 13 and R 14 are each independently a hydrogen atom or a hydrocarbon group optionally containing a hetero atom, or R 13 and R 14 are combined with each other to form a heterocycle, or N=NR 15 where R 15 is a hydrocarbon group; R 2 is a hydrocarbon group optionally containing a hetero atom; X + is a monovalent cation; n is 1 in the case where R 1 is S − or N − R 12 and is 0 in the case where R 1 is other than S − and N − R 12 . |