http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020247073-A1

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filingDate 2020-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e9e432ff6f9e48ef1c6911b4f8ff78c
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publicationDate 2020-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2020247073-A1
titleOfInvention Curable formulation with high refractive index and its application in surface relief grating using nanoimprinting lithography
abstract Disclosed herein are materials for nanoimprinting lithography (NIL) and devices molded from the materials using NIL processes. According to certain aspects, an NIL material includes a mixture including a light-sensitive base resin and nanoparticles. The light-sensitive base resin is characterized by a first refractive index ranging from 1.58 to 1.77. The nanoparticles are characterized by a second refractive index greater than the first refractive index of the light-sensitive base resin. The mixture is curable to form a cured material characterized by a third refractive index greater than 1.78. The nanoparticles include from 45 wt. % to 90 wt. % of the cured material.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022019015-A1
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priorityDate 2019-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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