Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-327 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32146 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32183 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
filingDate |
2020-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad064b977ea30cdfe5224c7bae5c664f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c3743fd6a7d4f70fa1d2d3d699152a9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_208fd14dacbaa5877fc94a08898e80b7 |
publicationDate |
2020-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2020176222-A1 |
titleOfInvention |
Multi-level parameter and frequency pulsing with a low angular spread |
abstract |
Systems and methods for multi-level pulsing of a parameter and multi-level pulsing of a frequency of a radio frequency (RF) signal are described. The parameter is pulsed from a low level to a high level while the frequency is pulsed from a low level to a high level. The parameter and the frequency are simultaneously pulsed to increase a rate of processing a wafer, to increase mask selectivity, and to reduce angular spread of ions within a plasma chamber. |
priorityDate |
2018-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |