| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0ee33b0e3e7398cf6fc957eeee59d510
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a013f27aee93b16ee05c95b0d161b734 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 |
| filingDate |
2020-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91305d6ca10bd9adb7b23be205af1690
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_911b5a19673f0626bbe3f51e5fdb9b46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9684a5ece7af566b99f66db3f49278ce
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c2018aa5e935d08ad6ee843b8c0af1b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0325387e5f6fda8e715b907e91a95e43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c98d75d8c5ee21d6d6b08b3e56d9ac8 |
| publicationDate |
2020-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2020150526-A1 |
| titleOfInvention |
Method for making microstructures and photolithography mask plate |
| abstract |
A method of making microstructures, including: setting a photoresist layer on a base; covering the photoresist layer with a photolithography mask plate, wherein the photolithography mask plate includes: a substrate; a carbon nanotube layer on the substrate; a patterned chrome layer on the carbon nanotube layer so that the carbon nanotube layer is sandwiched between the patterned chrome layer and the substrate, wherein a first pattern of the patterned chrome layer is the same as a second pattern of the carbon nanotube layer; a cover layer on the patterned chrome layer; exposing the photoresist layer to form an exposed photoresist layer by irradiating the photoresist layer through the photolithography mask plate with ultraviolet light; and developing the exposed photoresist layer to obtain a patterned photoresist microstructures. |
| priorityDate |
2016-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |