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filingDate 2019-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a1e4e729af35917ef626517db58ba79
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publicationDate 2020-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2020135554-A1
titleOfInvention Water Vapor Based Fluorine Containing Plasma For Removal Of Hardmask
abstract Apparatus, systems, and methods for conducting a hardmask (e.g., boron doped amorphous carbon hardmask) removal process on a workpiece are provided. In one example implementation, a method includes supporting a workpiece on a workpiece support in a processing chamber. The method can include generating a plasma from a process gas in a plasma chamber using a plasma source. The plasma chamber can be separated from the processing chamber by a separation grid. The method can include exposing the workpiece to one or more radicals generated in the plasma to perform a plasma strip process on the workpiece to at least partially remove the hardmask layer from the workpiece. The method can include exposing the workpiece to water vapor as a passivation agent during the plasma strip process.
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priorityDate 2018-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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