| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9047b16961c0aee78d7de367969339b2 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66833
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B43-27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B43-35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-11582 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-11582
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-66 |
| filingDate |
2019-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2329969ef96cf7ac9137a1d900b3a912
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2add18e01c81727dd581df5c1c20acd4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_377ce19eac8d5d678054166d4ed9b443
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a77ec04587ac00dd74996750cc5c0cf8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c2badfa5d65f1e094b07b421c35df7ee
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87b73780510150f4787a1eb565f92edf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2f85fa8ce427f51a92f0be6fe51526b |
| publicationDate |
2020-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2020127007-A1 |
| titleOfInvention |
Method for manufacturing semiconductor device |
| abstract |
A method of manufacturing a semiconductor device according to one embodiment includes forming a first film including a first metal above a processing target member. The method includes forming a second film including two or more types of element out of a second metal, carbon, and boron above the first film. The method includes forming a third film including the first metal above the second film. The method includes forming a mask film by providing an opening part to a stacked film including the first film, the second film and the third film. The method includes processing the processing target member by performing etching using the mask film as a mask. |
| priorityDate |
2015-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |