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filingDate 2019-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2020-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2020048769-A1
titleOfInvention Method and system for growth of graphene nanostripes by plasma enhanced chemical vapor deposition
abstract A method of forming vertical graphene nanostripes comprising one or several monolayers and characterized by a thickness normal to the one or several monolayers, a length orthogonal to the thickness, and a width orthogonal to the thickness includes providing a substrate, subjecting the substrate to a reduced pressure environment in a processing chamber, and providing methane gas and C6-containing precursor. The method also includes flowing the methane gas and the C6-containing precursor into the processing chamber, establishing a partial pressure ratio of the C6-containing precursor to methane gas in the processing chamber, and generating a plasma. The method further includes exposing at least a portion of the substrate to the methane gas, the C6-containing precursor, and the plasma and growing the vertical graphene nanostripes coupled to the at least a portion of the substrate, wherein the thickness of the vertical graphene nanostripes extends parallel to the substrate.
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