| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dd9ace3102979c58fe23109c31c84ce6 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F30-15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F2217-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2203-0298
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F2119-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F30-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2203-0062
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F2119-18 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F17-5095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N3-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N3-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F30-15 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N3-62 |
| filingDate |
2018-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ba605f565e12193497f89ab4070acfc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0306ef0bf7c2d2386613fb2d7f7e55eb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7823681f23e6d0d61bdcff6022dbeb4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_137e5791e54d372343dda1cff7d4ebb6 |
| publicationDate |
2020-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2020025661-A1 |
| titleOfInvention |
Notch treatment methods for flaw simulation |
| abstract |
A notch treatment method for flaw simulation including providing the specimen with the notch, the notch having a re-melt material layer; isolating the notch; and selectively etching the notch to provide an etched surface of the notch; wherein at least a portion of the re-melt material layer has been removed from the notch. In one aspect, there is provided a notch treatment method for flaw simulation including providing the specimen with the notch, the notch having a re-melt material layer, the specimen includes steel or an alloy thereof; isolating the notch; and selectively etching the notch with a first etching solution and a second etching solution to provide an etched surface on the notch; wherein at least a portion of the re-melt material layer has been removed from the notch. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10989640-B2 |
| priorityDate |
2015-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |