| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5858f3a8fd92eec55e7647eb2c9f8992
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dafbb8b19b5dd7177e0586bc6c224dcf |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-115 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0021
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-542
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0694
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-115 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-24 |
| filingDate |
2018-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4ff1e12dce0df27e1a28f48a5dc166c5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b0995de160cdc3abd6b8f73eda5ccdd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_201e7382ca0a4cdeb222695f6d20d4ec |
| publicationDate |
2019-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2019390321-A1 |
| titleOfInvention |
Film-formation method |
| abstract |
Provided is a film-formation method for a surface layer having high mechanical strength and a low refractive index. A step of film formation from a vapor deposition material by a vacuum vapor deposition method and a step of film formation by sputtering of a target constituent substance are repeated for the surfaces of substrates (S), thereby forming films with a lower refractive index than that of a film-forming material. |
| priorityDate |
2017-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |