| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67034
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J49-105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B25-186
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02293
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B25-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-08 |
| filingDate |
2019-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff325e9785106c9d26b4e383a153e2eb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6aa570d72ce6de75278c96d7c5a7df14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84b3fde0e1eab19f30b0ece8488038e9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b4cbe1dafba325891078e2bbf98b744
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f98a8ca44215f573e06a82e0e76abd00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4bf27b039644cc6cc45a0871342494ab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e45ff8080b1f7fbdefbca6174d6bef18 |
| publicationDate |
2019-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2019382917-A1 |
| titleOfInvention |
Method and apparatus for precleaning a substrate surface prior to epitaxial growth |
| abstract |
Embodiments of the present invention generally relate to methods for removing contaminants and native oxides from substrate surfaces. The methods generally include removing contaminants disposed on the substrate surface using a plasma process, and then cleaning the substrate surface by use of a remote plasma assisted dry etch process. |
| priorityDate |
2013-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |