| abstract |
A radiation-sensitive resin composition includes a resin including a structural unit having an acid-dissociable group, an onium salt compound represented by formula (1), and a solvent. n R 1 is a hydrogen atom or a monovalent group provided that the monovalent group is not a fluoro group or a monovalent organic group containing a fluorine atom. X 1 and X 2 are each independently a single bond, —O—, —S— or —NR′— wherein R′ is a hydrogen atom or a monovalent hydrocarbon group. In a case where X 1 is —NR′—, R 2 is a monovalent organic group or a hydrogen atom. In a case where X 2 is —NR′—, R 3 is a monovalent organic group or a hydrogen atom. In a case where neither X 1 nor X 2 is —NR′—, R 2 and R 3 are each independently a monovalent organic group. |