| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-093
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-148
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L2201-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-1452
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-1426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-146 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D125-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B1-128
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D179-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-093
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-0266
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D7-65
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-24 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B1-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G61-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-02 |
| filingDate |
2018-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45f251a01d70f4bf45a00b0321ebb56c |
| publicationDate |
2019-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2019180888-A1 |
| titleOfInvention |
Conductive polymer composition, coated article, and patterning process |
| abstract |
This provides a conductive polymer composition having good filterability and film-formability of a flat film onto an electron beam resist, and being suitably usable for a antistatic film for electron beam resist drawing having lower surface resistivity (Ω/□) to show excellent antistatic performance in an electron beam drawing process, and excellent peelability with H2O or an alkaline developer after drawing. |
| priorityDate |
2017-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |